Method of separating semiconductor dies from a semiconductor substrate, semiconductor substrate assembly and semiconductor die assembly

ABSTRACT

Separation grooves are etched from a main surface into a semiconductor substrate. The separation grooves separate chip regions in horizontal directions parallel to the main surface. At least some of the separation grooves are spaced from a lateral outer surface of the semiconductor substrate by at most a first distance. An indentation is formed along a lateral surface. The indentation extends from the main surface into the semiconductor substrate. A minimum horizontal indentation width of the indentation is equal to or greater than the first distance. A with respect to the main surface vertical extension of the indentation is equal to or greater than a vertical extension of the separation grooves.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of DE Application No.102016109693.8, filed on May 25, 2016, which application is herebyincorporated herein by reference.

TECHNICAL FIELD

The present invention relates generally to semiconductor devices, and,in particular embodiments, to methods of separating semiconductor diesfrom a semiconductor substrate, semiconductor substrate assembly andsemiconductor die assembly.

BACKGROUND

Die singulation denotes a process of isolating individual semiconductorchips or semiconductor dies from a semiconductor wafer. A dicing processaccomplished by scribing and breaking, e.g., by mechanical sawing orlaser cutting separates the semiconductor dies along kerf lines. Afterdicing, individual semiconductor chips are typically mounted onto chipcarriers and/or encapsulated in chip housings. DBG (dice before grind)firstly incompletely dices a wafer by using a half-cut dicer that formsdicing streets between chip regions on a wafer front side. A depth ofthe dicing streets is equal to or greater than a final target thicknessof the semiconductor chips. A stiff carrier member fixed to the dicedsurface stabilizes the half-diced wafer during a grinding process thatthins the wafer from the undiced surface to the final target thickness.The grinding process exposes the dicing streets and completes separationof the semiconductor chips. A flexible pick-up tape is attached onto theside of the semiconductor chips opposite to the grinding tape, thelatter being removed in the following. The pick-up tape may hold theseparated semiconductor chips in place until a handling apparatus oroperator picks up the semiconductor chips for further processing, e.g.,for packaging or placement.

There is a need to improve the yield of processes for die singulationsuch as DBG.

SUMMARY

According to an embodiment, a method of manufacturing semiconductordevices includes etching separation grooves from a main surface into asemiconductor substrate. The separation grooves separate chip regions inhorizontal directions parallel to the main surface. A distance betweenat least some of the separation grooves and the lateral outer surface isat most a first distance. An indentation is formed that extends along alateral outer surface from the main surface into the semiconductorsubstrate. A minimum horizontal indentation width is equal to or greaterthan the first distance and a with respect to the main surface verticalextension of the indentation is equal to or greater than a verticalextension of the separation grooves.

According to another embodiment, a semiconductor substrate assemblyincludes a semiconductor substrate that includes chip regionshorizontally separated by equally-spaced, parallel first separationgrooves and by equally-spaced, parallel second separation groovesextending from a main surface into the semiconductor substrate, whereinthe second separation grooves orthogonally intersect the firstseparation grooves. At least some of the separation grooves are spacedfrom a lateral outer surface of the semiconductor substrate by at most afirst distance. Along an edge, which the main surface forms with thelateral surface, an indentation extends from the main surface into thesemiconductor substrate. A with respect to the main surface verticalextension of the indentation is equal to or greater than a verticalextension of the separation grooves and a minimum horizontal indentationwidth is equal to or greater than the first distance.

According to a further embodiment a semiconductor die assembly includesa plurality of semiconductor dies, which are separated in two orthogonalhorizontal directions by equally-spaced separation trenches,respectively. The semiconductor dies are arranged within a circle with afirst radius around a center axis of the semiconductor die assembly. Thefirst radius is smaller than a wafer standard radius by an indentationwidth of at least 1 mm and at most 5 mm. The semiconductor die assemblyfurther includes at least one of a stiff carrier member and a flexiblepick-up tape. The carrier member is adhered onto first surfaces at afront side of the semiconductor dies through a radiation or thermalrelease adhesive film. The flexible pick-up tape is adhered onto secondsurfaces on the back of the semiconductor dies through a radiation orthermal release adhesive film.

Those skilled in the art will recognize additional features andadvantages upon reading the following detailed description and onviewing the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings are included to provide a furtherunderstanding of the invention and are incorporated in and constitute apart of this specification. The drawings illustrate the embodiments ofthe present invention and together with the description serve to explainprinciples of the invention. Other embodiments of the invention andintended advantages will be readily appreciated as they become betterunderstood by reference to the following detailed description.

FIG. 1A is a schematic top view of a portion of a semiconductorsubstrate for illustrating a method for separating semiconductor diesfrom a semiconductor substrate by a “dice before grind” processaccording to an embodiment concerning terminated mask grooves andinitially terminated separation grooves, after forming an etch mask.

FIG. 1B is a schematic vertical cross-sectional view of thesemiconductor substrate portion of FIG. 1A along line B-B.

FIG. 2A is a schematic top view of the semiconductor substrate portionof FIG. 1A, after forming terminated separation grooves.

FIG. 2B is a schematic vertical cross-sectional view of thesemiconductor substrate portion of FIG. 2A along line B-B.

FIG. 3A is a schematic top view of the semiconductor substrate portionof FIG. 2A, after forming, along a lateral surface, a circularindentation opening the separation grooves at the end faces.

FIG. 3B is a schematic vertical cross-sectional view of thesemiconductor substrate portion of FIG. 3A along line B-B.

FIG. 4 is a schematic vertical cross-sectional view of a portion of asemiconductor chip assembly including the semiconductor substrateportion of FIG. 3B, after attaching a carrier member on the mainsurface.

FIG. 5 is a schematic vertical cross-sectional view of the semiconductorchip assembly portion of FIG. 4, after grinding from a side opposite tothe main surface.

FIG. 6 is a schematic vertical cross-sectional view of the semiconductorchip assembly portion of FIG. 5, after attaching a pick-up tape on theside opposite to the main surface.

FIG. 7 is a schematic vertical cross-sectional view of the semiconductorchip assembly portion of FIG. 6, after stretching the pick-up tape.

FIG. 8A is a schematic top view of a portion of a semiconductorsubstrate for illustrating a comparative method for die singulation forillustrating effects of the embodiments, after forming an etch mask.

FIG. 8B is a schematic vertical cross-sectional view of thesemiconductor substrate portion of FIG. 8A along line B-B.

FIG. 9A is a schematic top view of the semiconductor substrate portionof FIG. 8A, after forming terminated separation grooves.

FIG. 9B is a schematic vertical cross-sectional view of thesemiconductor substrate portion of FIG. 9A along line B-B.

FIG. 10A is a schematic top view of a portion of a semiconductorsubstrate for illustrating a method for separating semiconductor diesfrom the semiconductor substrate by a “dice before grind” processaccording to an embodiment concerning open-ended mask grooves andinitially terminated separation grooves, after forming an etch mask.

FIG. 10B is a schematic vertical cross-sectional view of thesemiconductor substrate portion of FIG. 10A along line B-B.

FIG. 11A is a schematic top view of the semiconductor substrate portionof FIG. 10A, after forming separation grooves.

FIG. 11B is a schematic vertical cross-sectional view of thesemiconductor substrate portion of FIG. 11A along line B-B.

FIG. 12A is a schematic top view of the semiconductor substrate portionof FIG. 11A, after forming, along a lateral surface, a circularindentation horizontally opening the separation grooves at the endfaces.

FIG. 12B is a schematic vertical cross-sectional view of thesemiconductor substrate portion of FIG. 12A along line B-B.

FIG. 13A is a schematic top view of a portion of a semiconductorsubstrate for illustrating a method for separating semiconductor diesfrom the semiconductor substrate by a “dice before grind” processaccording to another embodiment concerning ab-initio open-endedseparation grooves opening out in a circumferential groove, afterforming an etch mask.

FIG. 13B is a schematic vertical cross-sectional view of thesemiconductor substrate portion of FIG. 13A along line B-B.

FIG. 13C is a schematic vertical cross-sectional view of thesemiconductor substrate portion of FIG. 13B along line B-B of FIG. 13A,after forming separation grooves and an indentation.

FIG. 14A is a schematic top view of a portion of a semiconductorsubstrate for illustrating a method for separating semiconductor diesfrom the semiconductor substrate by a “dice before grind” processaccording to another embodiment concerning terminated mask grooves andinitially terminated separation grooves without stubs, after forming anindentation.

FIG. 14B is a schematic vertical cross-sectional view of thesemiconductor substrate portion of FIG. 14A along line B-B.

FIG. 15A is a schematic vertical cross-sectional view of a portion of asemiconductor substrate including separation grooves and a circularindentation according to an embodiment without carrier tape.

FIG. 15B is a schematic vertical cross-sectional view of a portion of asemiconductor substrate including separation grooves and a circularindentation according to an embodiment with a carrier tape.

FIG. 16A is a schematic cross-sectional view of a portion of asemiconductor chip assembly according to an embodiment wherein aplurality of semiconductor chips is attached on a carrier member.

FIG. 16B is a schematic cross-sectional view of a portion of asemiconductor chip assembly according to an embodiment wherein aplurality of semiconductor chips is attached on a pick-up tape.

DETAILED DESCRIPTION OF ILLUSTRATIVE EMBODIMENTS

In the following detailed description, reference is made to theaccompanying drawings, which form a part hereof and in which are shownby way of illustrations specific embodiments in which the invention maybe practiced. It is to be understood that other embodiments may beutilized and structural or logical changes may be made without departingfrom the scope of the present invention. For example, featuresillustrated or described for one embodiment can be used on or inconjunction with other embodiments to yield yet a further embodiment. Itis intended that the present invention includes such modifications andvariations. The examples are described using specific language, whichshould not be construed as limiting the scope of the appending claims.The drawings are not scaled and are for illustrative purposes only.Corresponding elements are designated by the same reference signs in thedifferent drawings if not stated otherwise.

The terms “having”, “containing”, “including”, “comprising” and the likeare open, and the terms indicate the presence of stated structures,elements or features but do not preclude the presence of additionalelements or features. The articles “a”, “an” and “the” include theplural as well as the singular, unless the context clearly indicatesotherwise.

FIGS. 1A to 7 concern a method of separating semiconductor chips from asemiconductor substrate by a DBG method based on an etch process forpre-dicing, wherein initially terminated separation grooves are laterhorizontally opened at the end faces by an indentation formed along alateral surface of the semiconductor substrate.

A photoresist layer is deposited on a main surface 101 at a front sideof a semiconductor substrate 100. An EBR (edge bead removal) process mayremove a portion of the deposited photoresist in a circumferential strapalong the edge of the main surface 101. The remaining portion of thephotoresist layer is partially exposed and developed to form an etchmask 400.

FIGS. 1A and 18 show isolated mask portions 410 of the etch mask 400 onthe main surface 101 of the semiconductor substrate 100.

The semiconductor substrate 100 may be a processed semiconductor waferbased on a crystalline semiconductor material such as crystallinesilicon, germanium, silicon carbide or an A_(III)B_(V) semiconductor. Inaddition to a layer of semiconductor material, the semiconductorsubstrate 100 may include a layer of insulating material, for example,silicon oxide, silicate glass, or a ceramic.

Shape and dimensions of the semiconductor substrate 100 are compatiblewith conventional production lines for semiconductor devices. Thesemiconductor substrate 100 may have an approximately cylindrical shape,wherein one of two parallel planar surfaces forms the main surface 101.The outer surface (lateral surface) 103 of the semiconductor substrate100 may include a flat parallel to the cylinder axis, wherein the flatindicates a main crystal direction. The diameter of the semiconductorsubstrate 100 may be 50.8 mm (2 inch), 76.2 mm (3 inch), 100 mm (“4inch”), 150 mm (“6 inch”), 200 mm (“8 inch” wafer), or 300 mm (“12 inch”wafer), by way of example. A thickness of the semiconductor substrate100 may be between several 10 μm and 800 μm, by way of example.

A normal to the main surface 101 defines a vertical direction.Directions parallel to the main surface 101 are horizontal directions.

The semiconductor substrate 100 includes chip regions 110 arrangedmatrix-like in lines and rows and spaced from each other by idlesubstrate stripes. Each chip region no is formed along or close to themain surface 101 and includes a plurality of interconnected passive andactive electronic components. The chip regions no may also include ametallization layer at the front side along the main surface 101. Forexample, the chip regions no correspond to the dies of microcontrollersfor chip cards, e.g., mobile phone SIM cards, payment cards, or securitychips.

The chip regions no include complete chip regions 111 corresponding tofully functional semiconductor chips as well as incomplete chip regions119 at the end of lines and rows of chip regions no. Due to thecurvature of the semiconductor substrate 100 at the end of at least someof the lines and rows no complete semiconductor chips can be formed.Nevertheless, the incomplete chip regions 119 are subjected to the sameprocesses as the complete chip regions 111.

The etch mask 400 includes a plurality of equally spaced mask portions410. Straight mask trenches 450 separate the mask portions 410 from eachother, wherein first parallel mask trenches 451 orthogonally intersectsecond parallel mask trenches 452. The first and second mask trenches451 define a grid, wherein the mask portions 410 in the meshes of thegrid are in the vertical projection of the chip regions no.

In an edge exclusion strap 455 with an approximately uniform edgeexclusion width ex0 the EBR exposes the main surface 101. A boundarymask portion 480 directly adjoins the edge exclusion strap 455 andsurrounds the plurality of mask portions 410.

According to the illustrated embodiment, the boundary mask portion 480terminates the mask trenches 450 at their end faces such that the masktrenches 450 are confined in all horizontal directions and the boundarymask portion 480 forms a closed, circumferential structure surrounded bythe edge exclusion strap 455. The boundary mask portion 480 maycompletely cover the incomplete chip regions 119.

The shape of an outer edge of the boundary mask portion 480 mainlyincludes a segment of a circle and may include a straight line parallelto the wafer flat. The inner edge of the boundary mask portion 480 maybe a stepped line of orthogonal line sections.

At least some of the mask trenches 450, i.e., a true subset of the masktrenches 450 have a distance to the lateral surface 103 that is notgreater than a first distance ex1.

At least some or all of the mask trenches 450 may include stubsextending into to the boundary mask portion 480 such that at each endevery mask trench 450 has a distance not greater than the first distanceex1 to the lateral surface 103.

According to another embodiment, the mask trenches 450 do not includestubs and the inner edge of the boundary mask portion 480 exclusivelyincludes line portions parallel to and opposite of edges of the maskportions 410. In this case, only a true subset of the mask trenches 450has a distance not greater than the first distance ex1 to the lateralsurface 103.

According to further embodiments the mask trenches 450 may open out intoa circumferential mask trench or into free space.

An etching process, e.g., a plasma etch such as RIE (reactive ionetching) uses the etch mask 400 to form separation grooves 150 betweenthe chip regions no. A ring-shaped ceramic frame may shield the completeedge exclusion strap 455 or at least a portion thereof against theetching reactants.

FIGS. 2A and 2B show the separation grooves 150 extending from the mainsurface 101 into the semiconductor substrate 100. A horizontal width w1of the separation grooves 150 may be in a range from 4 μm to 20 μm, forexample in a range from 6 μm to 15 μm.

A vertical extension v1 of the separation grooves 150 may be equal to orgreater than a final vertical extension of the finalized semiconductorchip and may be in a range from several ten micrometers to severalhundred micrometers, e.g., in a range from 10 μm to 300 μm, e.g., up to250 μm. The separation grooves 150 include equally spaced parallel firstseparation grooves 151 and equally spaced parallel second separationgrooves 152 orthogonal to the first separation grooves 151 andintersecting the first separation grooves 151.

An edge groove 155 may extend along the edge of the main surface 101 tothe lateral surface 103 provided that the etch process is effective atleast to some degree in the area of the edge exclusion strap 455, e.g.,if no ring-shaped ceramic frame is used. A vertical extension of theedge groove 155 may be smaller than, equal to or greater than thevertical extension v1 of the separation grooves 150. The use of aring-shaped ceramic frame may suppress formation of the edge groove 155.

A distance of the end faces of the separation grooves 150 to the lateralsurface 103 of the semiconductor substrate 100 is not greater than thefirst distance ex1, which may be greater than the edge exclusion widthex0.

Compared to mechanical processes for forming the separation grooves 150,for example, by using a sawing blade the etch process allows fornarrower separation grooves 150. Narrower separation grooves 150 allowfor increasing the number of chip regions no per semiconductor substrate100. Sidewalls of the exposed chip regions no are only to a low degreeprone to the formation of cracks.

Due to characteristics of process chambers typically used for plasmaetching, or by the use of a ring-shaped ceramic frame, the separationgrooves 150 do not reach the lateral surface 103 as it would be the casefor sawing process. Typically, the etch process is well defined inregions of the semiconductor substrate 100 outside of and enclosed bythe circumferential edge exclusion strap 455, whereas within the edgeexclusion strap 455 the etch process may be ill-defined or more or lesswithout effect.

An indentation 158 is formed along the lateral surface 103, e.g., by amechanical round-cut or by a grinding process centered to the centeraxis of the semiconductor substrate 100. According to other embodiments,the indentation 158 may be formed by an etch process, e.g. a dedicatedetch process using an etch mask covering completely the inner part ofthe semiconductor substrate 100.

FIGS. 3A and 3B show the indentation 158 with a vertical extension v2which is equal to or greater than the vertical extension v1 of theseparation grooves 150. The indentation 158 may have uniform width alongthe whole circumference of the semiconductor substrate 100 including apossible lateral flat. A minimum width ex2 of the indentation 158 isequal to or greater than the first distance ex1.

The indentation 158 opens the separation grooves 150 at their end facessuch that the separation grooves 150 open out into the indentation 158.The indentation 158 may form steps 104 at the boundary to the separationgrooves iso. The first and second separation grooves 151, 152 areopen-ended and end in free space.

Between the main surface 101 and the bottom of the separation grooves150 the semiconductor substrate 100 exclusively includes isolated chipregions 110 and does not include a portion forming a continuouscircumferential structure around the plurality of complete chip regions111. Both the complete chip regions 111 and the incomplete chip regions119 are isolated from each other.

A stiff carrier member 310, e.g., a grinding tape, is reversiblyattached to the main surface 101, for example, by adhesion.

The carrier member 310 shown in FIG. 4 may be a rigid, non-stretchingfilm that is adhered to the main surface 101, for example, a temporarybonding adhesive tape that may include a PET/LCP (polyethyleneterephthalate/liquid crystalline polymer) base film and a radiation orthermal release adhesive film for reversibly adhering the base film tothe semiconductor substrate 100.

According to the illustrated embodiment, the separation grooves 150 mayremain unfilled before applying the carrier member 310 such that thecarrier member 310 covers empty separation grooves 150. According toother embodiments, a passivation layer may be formed that lines at leastportions of the sidewalls of the chip regions no prior to applying thecarrier member 310 or a fill process may fill the separation grooves 150with a sacrificial material, e.g., before forming the indentation 158.

Starting from the undiced surface 102 opposite to the main surface 101,a grinding process removes an undiced section 120 of the semiconductorsubstrate 100. For example, a grinding wheel grinds the semiconductorsubstrate 100 from the back. The grinding opens the separation grooves150 from the back and completes separation of the chip regions no.

FIG. 5 shows isolated semiconductor dies 210 formed from the fullyseparated chip regions no of FIG. 4. Separation trenches 250 formed fromthe vertically opened separation grooves 150 of FIG. 4 separate thesemiconductor dies 210. A vertical extension of the separation trenches250 may be equal to or smaller than the vertical extension of theseparation grooves 150 of FIG. 4. In the horizontal directions, theseparation trenches 250 end in free space and no remnants of thesemiconductor substrate 100 of FIG. 4 are in the longitudinal projectionof the separation trenches 250.

The semiconductor dies 210 include complete semiconductor dies 211formed from complete chip regions 111 of FIG. 4 as well as scrap dies219 formed from the incomplete chip regions 119 of FIG. 4. A firstsurface 201 at a front side of the semiconductor dies 210 is attached tothe carrier member 310 and a second surface 202 on the back is exposed.

The semiconductor dies 210 are arranged within a circle with a firstradius r1 around a center point. The first radius r1 is smaller than awafer standard radius R1 by the indentation width ex2, i.e., r1=R1−ex2.R1 may be, e.g., 150 mm, 100 mm, 75 mm, or 50 mm. The horizontalindentation width ex2 is in a range from 1.5 mm to 4 mm, e.g., about 3.1mm

A stretchable pick-up tape 320 is attached to the exposed second surface202 of the semiconductor dies 210 and the carrier member 310 is removedfrom the first surface 201 of the semiconductor dies 210.

FIG. 6 shows singulated semiconductor dies 210 separated by separationtrenches 250, arranged matrix-like in lines and rows and with the secondsurfaces 202 attached on the pick-up tape 320. The pick-up tape 320 isexpendable and can be put into an expansion frame.

As shown in FIG. 7 the pick-up tape 320 may be horizontally stretchedalong the longitudinal axis of first separation trenches or into twoorthogonal horizontal directions along the longitudinal axes of firstseparation trenches and of second separation trenches orthogonal to thefirst separation trenches, wherein the separation trenches 250 expandfrom the first width w1 to a second width w2 greater than the firstwidth w1 such that conventional handling equipment can pick up thesemiconductor dies 210 from the pick-up tape 320 for packaging orplacement.

Compared to conventional DBG schemes using mechanical half-cut sawingfrom the front side, forming the separation grooves 150 by achemical-physical etching process allows for narrower separation grooves150 such that yield per wafer may be increased by several percent.Equipment constraints typically exclude etching along the lateralsurface of a semiconductor substrate, restrict the etchable area to acentral portion of a semiconductor substrate, and exclude well-definedetching in a ring-shaped edge exclusion area along the lateral surface.As a consequence, other than mechanical sawing streets, the etchedseparation grooves 150 do not cross the complete wafer and end withinthe semiconductor substrate 100 in a distance to the lateral surface103. A remnant portion of the semiconductor substrate may form closedsubstrate ring that surrounds the separated semiconductor dies 210 whenthe singulated semiconductor dies 210 are attached to a stretchablepick-up tape 320. The closed substrate ring is not stretchable andtherefore has to be removed from either the carrier member 310 beforeattaching the pick-up tape 320 or from the pick-up tape 320 beforestretching the pick-up tape 320 for picking up the semiconductor dies210. Removing the substrate ring, however, involves an additional,dedicated process that may inadvertently remove also functionalsemiconductor dies which get lost. Removal of the substrate ringgenerates extra costs and reduces the total yield.

According to the embodiments, the indentation 158 overlaps with some orall of the first and second separation grooves 151, 152 such that atleast some of the separation grooves 150, e.g., at least 50% of theseparation grooves 150 and, as a consequence, the separation trenches250 are open-ended and end in free space. No closed substrate ringsurrounds the plurality of semiconductor dies 210 in the horizontalplane. The pick-up tape 320 with the singulated semiconductor dies 210can be expanded without any additional step for selectively removing asubstrate ring.

FIGS. 8A to 9B refer to a comparative example with terminated separationgrooves. FIGS. 8A and 8B show an etch mask 400 with mask trenches 451,452 separating isolated mask portions 410 from each other and from aboundary mask portion 480 that forms a closed, circumferential maskstructure around the mask portions 410. The mask trenches 451, 452 donot include stubs extending into the boundary mask portion 480 and aninner edge of the boundary mask portion 480 includes only orthogonalline portions opposite to mask portions 410.

FIGS. 9A and 9B show the semiconductor substrate 100 after formingseparation grooves 150 in a vertical projection of the mask trenches 450of FIGS. 8A and 8B. Even if the semiconductor substrate 100 is recessedin the area of the edge exclusion strap 455 such that an edge groove 155extends along the edge of the main surface 101, a continuous substratering 180 is formed in the vertical projection of the boundary maskportion 480. The substrate ring between the edge groove 155 and theseparation grooves 150 terminates the separation grooves 150. Thesubstrate ring 180 has to be removed before semiconductor dies obtainedfrom the chip regions no can be picked up from a stretched pick-up tape.

FIGS. 10A to 12B refer to an embodiment where the semiconductorsubstrate 100 is not etched in the edge exclusion strap 455.

As shown in FIGS. 10A to 10B, the mask trenches 450 are open-ended,extend through the complete mask layer and open out into the edgeexclusion strap 455. An etch process recesses portions of thesemiconductor substrate 100 exposed by the mask trenches 450 but is noteffective in at least a portion of the edge exclusion strap 455.

As shown in FIGS. 11A to 11B, the separation grooves 150 formed in thesemiconductor substrate 100 are horizontally terminated at the end facesby an unrecessed substrate ring 180 in a region within the edgeexclusion strap 455, e.g., along the lateral surface 103. For example, aring-shaped ceramic frame is placed between the semiconductor substrate100 and an ion beam source when the separation grooves 150 are formed,wherein a diameter of the opening of the ring-shaped ceramic frame issmaller than the diameter of the semiconductor substrate 100.

An indentation 158 with a minimum indentation width ex2 that is equal toor greater than the width ex0 of the edge exclusion strap 455 or equalto or greater than the diameter of the opening of the ring-shapedceramic frame is formed along the edge of the main surface 101.

FIGS. 12A and 12B show that forming the indentation 158 completelyremoves the unrecessed substrate ring 180.

FIGS. 13A to 13B show a circumferential mask trench 457 connecting thefirst and second mask trenches 451, 452, wherein a circumferential maskring 470 separates the circumferential mask trench 457 from the edgeexclusion strap 455.

FIG. 13C shows that an indentation 158 removes an unrecessed substratering that may be formed in the vertical projection of the mask ring 470of FIGS. 13A and 13B or, in case the semiconductor substrate 100 is notrecessed in the edge exclusion strap 455, in the vertical projection ofboth the mask ring 470 and the edge exclusion strap 455.

FIGS. 14A and 14B refer to an embodiment applying an indentation 158 ona semiconductor substrate 100 patterned as illustrated in FIGS. 8A to9B. The indentation 158 opens at least some of the separation groovesiso. Instead of a continuous substrate ring, a plurality of separatedscrap portions 180 x including the incomplete chip regions 119 isformed. The separated scrap portions 180 x are arranged along a linesurrounding a matrix of complete chip regions 111 such that a pick-uptape attached to semiconductor dies obtained from the chip regions 111and to the separated scrap portions 180 x can be sufficiently expandedinto orthogonal horizontal directions.

FIG. 15A shows a semiconductor substrate assembly 501 with asemiconductor substrate 100 with separation grooves 150 extending from amain surface 101 into the semiconductor substrate 100. A horizontalwidth w1 of the separation grooves 150 may be in a range from 6 μm to 20μm. A vertical extension v1 of the separation grooves 150 is in a rangefrom 10 μm to 300 μm, e.g. up to 250 μm. The separation grooves 150include equally-spaced, parallel first separation grooves 151 andequally-spaced, parallel second separation grooves 152 orthogonal to thefirst separation grooves 151 and intersecting the first separationgrooves as illustrated in FIG. 3A. The separation grooves 150horizontally separate chip regions no in the semiconductor substrate100. Along an edge of the main surface 101 with the lateral surface 103an indentation 158 extends from the main surface 101 into thesemiconductor substrate 100. A vertical extension v2 of the indentation158 is equal to or greater than a vertical extension v1 of theseparation grooves 150. The indentation 158 may have a uniformindentation width ex2 of at least 3 mm.

Each chip region no is formed along or close to the main surface 101 andincludes a plurality of interconnected passive and active electroniccomponents. The chip regions no may include a metallization layer at thefront side along the main surface 101. The chip regions no maycorrespond to the dies of microcontrollers for chip cards, e.g., mobilephone SIM cards, payment cards, or security chips.

The chip regions no are arranged within a circle with a first radius r1around a center axis of the semiconductor substrate 100. The firstradius r1 is smaller than a wafer standard radius R1 by the indentationwidth ex2, i.e., r1=R1−ex2. R1 may be, e.g., 150 mm, 100 mm, 75 mm, or50 mm. The indentation width ex2 is in a range from 1.5 mm to 4 mm,e.g., about 3.1 mm.

In FIG. 15B a semiconductor substrate assembly 501 includes a stiffcarrier member 310 attached onto a main surface 101 at the front side ofa semiconductor substrate 100 as described with reference to FIG. 15A.The carrier member 310 may be a rigid, non-stretching film. According toan embodiment the carrier member is a temporary bonding adhesive tapethat may include a PET/LCP (polyethylene terephthalate/liquidcrystalline polymer) base film and a radiation or thermal releaseadhesive film for reversibly adhering the base film to the semiconductorsubstrate 100.

FIG. 16A refers to a semiconductor die assembly 502 including aplurality of semiconductor dies 210 attached matrix-like in lines androws and equally spaced from another on a carrier member 310.

The semiconductor dies 210 may include a metallization layer along firstsurfaces 201 adhered to the carrier member 310. The semiconductor dies210 may by dies for microcontrollers for chip cards, e.g., mobile phoneSIM cards, payment cards, or security chips.

The semiconductor dies 210 are arranged within a circle with a firstradius r1 around a center axis of the arrangement of semiconductor dies210. The first radius r1 is smaller than a wafer standard radius R1 bythe indentation width ex2, i.e., r1=R1−ex2. R1 may be, e.g., 150 mm, 100mm, 75 mm, or 50 mm. The indentation width ex2 is in a range from 1.5 mmto 5 mm, e.g., about 3.1 mm.

In FIG. 16B a flexible pick-up tape 320 attached onto second surfaces202 on the back of the semiconductor dies 210 through a radiation orthermal release adhesive film substitutes the carrier member 310 of FIG.16B. The pick-up tape 320 may include a substrate film from, e.g., PVC(Polyvinyl Chloride) or polyolefin and an adhesion film from, e.g.,rubber or UV-sensitive acrylic. A further embodiment combines thesemiconductor substrate 100 with both the pick-up tape of FIG. 16B andthe carrier member 310 of FIG. 16A.

Although specific embodiments have been illustrated and describedherein, it will be appreciated by those of ordinary skill in the artthat a variety of alternate and/or equivalent implementations may besubstituted for the specific embodiments shown and described withoutdeparting from the scope of the present invention. This application isintended to cover any adaptations or variations of the specificembodiments discussed herein. Therefore, it is intended that thisinvention be limited only by the claims and the equivalents thereof.

What is claimed is:
 1. A method of manufacturing semiconductor devices,the method comprising etching separation grooves from a main surfaceinto a semiconductor substrate comprising chip regions, wherein theseparation grooves separate the chip regions in horizontal directionsparallel to the main surface and wherein at least some of the separationgrooves are spaced from a lateral outer surface of the semiconductorsubstrate by at most a first distance; and forming an indentation alonga lateral surface, wherein the indentation extends from the main surfaceinto the semiconductor substrate, wherein a minimum horizontalindentation width is equal to or greater than the first distance, andwith respect to the main surface, a vertical extension of theindentation is equal to or greater than a vertical extension of theseparation grooves.
 2. The method of claim 1, further comprisingremoving an undiced section of the semiconductor substrate from a rearside opposite to the main surface, wherein the separation grooves areexposed from the rear side and isolated semiconductor dies are obtainedfrom the chip regions.
 3. The method of claim 2, further comprisingattaching a stretchable pick-up tape on a side of the isolatedsemiconductor dies exposed by removing the undiced section.
 4. Themethod of claim 2, wherein the undiced section of the semiconductorsubstrate is removed by grinding.
 5. The method of claim 1, wherein theseparation grooves comprise parallel first separation grooves andparallel second separation grooves intersecting the first separationgrooves orthogonally.
 6. The method of claim 1, wherein the indentationincludes at least a segment of a circle with a center point coincidingwith a center axis of the semiconductor substrate.
 7. The method ofclaim 1, wherein the indentation is formed mechanically.
 8. The methodof claim 1, wherein the indentation is formed by a round-cut.
 9. Themethod of claim 1, wherein the indentation is formed by etching.
 10. Themethod of claim 1, wherein a ring-shaped ceramic frame covers at least aportion of an edge exclusion area along the lateral surface during theetching of the separation grooves.
 11. The method of claim 1, furthercomprising attaching, after forming the indentation, a stiff carriermember on the main surface.
 12. The method of claim 1, wherein theseparation grooves comprise stubs extending into a substrate ring formedfrom a portion of the semiconductor substrate.
 13. The method of claim1, wherein forming the separation grooves comprises forming an etch maskon the main surface, the etch mask comprising isolated mask portions ina vertical projection of the chip regions, wherein mask trenchesseparating the mask portions from each other are terminated at thelongitudinal end faces.
 14. The method of claim 1, wherein forming theseparation grooves comprises forming an etch mask on the main surface,the etch mask comprising isolated mask portions in a vertical projectionof the chip regions and a mask ring, wherein a distance of the mask ringto the outer lateral surface is at least the first distance and whereintrench ends of the mask trenches open out into the mask ring.
 15. Themethod of claim 1, wherein each of the separation grooves is spaced fromthe lateral outer surface by not more than the first distance.
 16. Asemiconductor substrate assembly, comprising a semiconductor substratethat comprises chip regions horizontally separated by equally-spaced,parallel first separation grooves and by equally-spaced, parallel secondseparation grooves extending from a main surface into the semiconductorsubstrate, wherein the second separation grooves orthogonally intersectthe first separation grooves and at least some of the separation groovesare spaced from a lateral outer surface of the semiconductor substrateby at most a first distance, along an edge formed between the mainsurface and the lateral surface, an indentation extends from the mainsurface into the semiconductor substrate, wherein with respect to themain surface, a vertical extension of the indentation is equal to orgreater than a vertical extension of the separation grooves and aminimum horizontal indentation width is equal to or greater than thefirst distance.
 17. The semiconductor substrate assembly of claim 16,wherein a horizontal width of the first and second separation grooves isin a range from 6 μm to 20 μm and a vertical extension of the separationgrooves is in a range up to 300 μm.
 18. The semiconductor substrateassembly of claim 16, wherein the indentation width is at least 3 mm.19. The semiconductor substrate assembly of claim 16, wherein the chipregions correspond to dies of microcontrollers for chip cards.
 20. Thesemiconductor substrate assembly of claim 16, wherein the chip regionsare arranged within a circle with a first radius around a center axis ofthe semiconductor substrate and the first radius is smaller than a waferstandard radius by the indentation width.
 21. The semiconductorsubstrate assembly of claim 20, wherein the wafer standard radius is oneof 150 mm, 100 mm, 75 mm, and 50 mm.
 22. The semiconductor substrateassembly of claim 16, further comprising a stiff carrier member adheredonto the main surface of the semiconductor substrate through a radiationor thermal release adhesive film.
 23. The semiconductor substrateassembly of claim 16, wherein each of the separation grooves is spacedfrom the lateral outer surface of the semiconductor substrate by notmore than the first distance.